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Cosmetic Ingredients

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Paula’s Choice RESIST Skin Restoring Moisturizer SPF 50

Active Ingredients: Avobenzone 3%; Homosalate 5%; Octinoxate 7.50%; Octisalate 5%; Oxybenzone 5% (sunscreen actives).
Inactive Ingredients: Water (Aqua), Silica (opacifier and texture enhancer), Glycerin (hydration), Cetearyl Alcohol (texture enhancer), Dimethicone (hydration), Butylene Glycol, Pentylene Glycol (hydration), Potassium Cetyl Phosphate (emulsifier), Cyclopentasiloxane (hydration), Pyrus Malus (Apple) Fruit Extract (skin-restoring), VP/Eicosene Copolymer (texture enhancer), Butyrospermum Parkii (Shea) Butter (emollient), Allantoin (skin soothing), Niacinamide (skin-restoring), Tocopherol (vitamin E/antioxidant), Glycyrrhiza Glabra (Licorice) Root Extract (skin soothing), Aloe Barbadensis Leaf Juice (hydration, soothing), Atractylodes Macrocephala Root Powder (antioxidant), Avena Sativa (Oat) Kernel Extract (skin soothing), Coffea Arabica (Coffee) Seed Extract, Portulaca Oleracea Extract, Mahonia Aquifolium Root Extract, Diethylhexyl Syringylidenemalonate (antioxidants), Sarcosine, Capryloyl Glycine, Maltooligosyl Glucoside, Cetearyl Glucoside (skin softeners), Dimethiconol (texture enhancer), Acrylates/C10-30 Alkyl Acrylate Crosspolymer (stabilizer), Hydrogenated Starch Hydrolysate (hydration), Hexylene Glycol (texture enhancer), 4-T-Butylcyclohexanol (emollient), Glyceryl Stearate, PEG-100 Stearate (texture enhancers), Sodium Hydroxide (pH adjuster), Xanthan Gum (stabilizer), Disodium EDTA (chelating agent), Phenoxyethanol, Caprylyl Glycol, and other

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